Bolivarallee 22 · D-14050 Berlin
Tel.+49(0)30 84185 480
eMail: info@jcmwave.com
News
February 23-24, 2012:
Matheon-Workshop "5th Annual Meeting Photonic Devices" at JCMwave's scientific partner Zuse Institute Berlin (ZIB) in Berlin, Germany.
February 23, 2012:
JCMwave User Meeting, Berlin, Germany. Please contact info@jcmwave.com if you are interested in participation at the user meeting.
January 24-26, 2012:
SPIE Photonics West, San Francisco, US. Please visit us at booth number 4601-46 (Moscone Convention Center, North Hall, German Pavilion).
January 2012:
JCMsuite Version 2.6 released. This version features treatment of general illumination setups including extended light sources of partially polarized and partially coherent light. The new MATLAB interface further enables faster and more comfortable scripting.
August 1, 2011:
JCMsuite Version 2.4 released. This version features improved functionalities and solvers for new problem classes.
May 23-26, 2011:
SPIE Europe Optical Metrology, Munich, Germany. JCMwave will present its methods for metrology / profile reconstruction at the Conference on Modeling Aspects in Optical Metrology.
May 23-26, 2011:
LASER World of Photonics, Munich, Germany. Please visit JCMwave at the exhibition. You find us at Hall B1, Booth 462.
February 17, 2011:
JCMwave User Meeting, Berlin, Germany. Please contact info@jcmwave.com if you are interested in participation at the user meeting.
- January 22-27, 2011:
- SPIE Photonics West, San Francisco, US. Please visit us at booth number 4601-47 (North Hall, German Pavilion).
- September 13-16, 2010:
- SPIE Photomask Technology (BACUS), Monterey, US. Please visit the technical conference to hear about JCMwave's recent developments in Source Mask Optimization techniques (Proc. SPIE 7823 (2010) 78230E).
- July 6-8, 2009:
- 5th Workshop on Numerical Methods for Optical Nano Structures, ETHZ, Zürich, Switzerland. Please attend the "Short course on FEM codes for plasmonics and optical nano structures" to learn more about JCMwave's FEM solvers.
- September 14-17, 2009:
- SPIE Photomask Technology (BACUS), Monterey, US. Please visit the Simulation and Modelling session at the technical conference to hear about JCMwave's recent developments in Computational Lithography (paper 7488-83).