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April 16-18, 2008:
Meet JCMwave at the Photomask Japan 2008 / Symposium on Photomask and NGL Mask Technology XV, Yokohama, Japan.

PMJ




February 26-27, 2008:
JCMwave presents it's lithography simulation tools at the SPIE Advanced Lithography Meeting, San Jose. Please visit us at booth # 807.

SPIE Advanced Lithography Meeting




January 22-24, 2008:
JCMwave presents it's advanced simulation tools at the Photonics West, San Jose. Please visit us at booth # 6600 in South Hall 2. Further, new results on the performance of JCMwave's finite element methods will be presented in a Conference talk (Conference 6896, talk # 1, Mon 21 January 08, 10:30).

JCMwave at Photonics West





October 1, 2007:
Research on nanostructured 'Kagome'-fibers by leading physicist Philip J. St. Russell and coworkers is published in Optics Express. JCMmode is used to verify results obtained from simplified models.

Opt. Express 15 (20), 12680-12685 (2007). [article]




September 17-21, 2007:
Our finite element solvers for rigorous simulations of isolated mask features are presented at the BACUS / SPIE Photomask Technology conference at Monterey, CA, US.

BACUS / SPIE Photomask
Proc. SPIE Vol. 6730 (2007). [preprint]




June 17-21, 2007:
New research on the application of our simulation tools to component design, EUV lithography and to precision metrology is presented at the Laser 2007 in Munich / SPIE Optical Metrology conference.

SPIE Optical Metrology
Proc. SPIE Vol. 6617 (2007) 66170V. [preprint]
Proc. SPIE Vol. 6617 (2007) 661718.




February 27-28, 2007:
JCMwave presents it's lithography simulation tools with extended 3D simulation functionalities at the SPIE Advanced Lithography Meeting, San Jose. Please visit us at booth # 1004.

SPIE Advanced Lithography Meeting




January 23-25, 2007:
JCMwave presents it's advanced simulation tools at the Photonics West, San Jose. Please visit us at booth of Sciopt Enterprises, booth # 3014, and at the Conference. Two conference talks concentrate on research with JCMwave's software, regarding goal oriented adaptive finite element methods and FEM investigationof leaky modes in hollow core photonic crystal fibers.

JCMwave at Photonics West
Proc. SPIE Vol. 6480 (2007) 648022. [preprint]
Proc. SPIE Vol. 6475 (2007) 647516. [preprint]




September, 2006:
Prof. Dr. Dr. h.c. Peter Deuflhard, President of the Zuse Institute Berlin, has been awarded the ICIAM Maxwell Prize by the International Council of Industrial and Applied Mathematics (ICIAM). ICIAM honors the original, deep and outstanding contributions of Prof. Deuflhard to the field of Applied Mathematics. JCMwave congratulates Prof. Deuflhard, who supports the company being the head of its scientific board.

Maxwell-Prize Winner P. Deuflhard


September, 19-22, 2006:
JCMwave presents its 3D and EUV Tools for Photolithography at the SPIE Photomask Technology Conference, Monterey, USA. Please visit us at the exhibition (booth # 417) and at the conference (contributions 6349-128 and 6349-192).



September, 2, 2006:
Article on Efficient optimization of hollow-core photonic crystal fiber design using the finite element method has been published in JEOS-Rapid Publications 1, 0611 (2006) (featuring JCMmode).



June 1, 2006:
'Software speeds up nano-optical design':
Optics and Laser Europe, Europe's leading magazine for optoelectronics, photonics, laser technology and fibre optics features JCMwave's efficient finite element software on it's cover page and in an editorial article.
OLE Title June 2006


April 26-28, 2006:
JCMwave presents it's products at OSA's IPRA meeting - Integrated Photonics Research and Applications, Uncasville, Connecticut, USA.



March, 23, 2006:
JCMwave's FEM tools for applications in nano-optics are investigated in a presentation at the Laser Optik Berlin conference (LOB 2006), Berlin, Germany.



February, 21-22, 2006:
JCMwave presents it's products at SPIE's Microlithography 2006, San Jose, CA. Learn more about our lithography simulators at booth #2001.



January, 24-26, 2006:
JCMwave presents it's products at the Photonics West, San Jose, CA. Please visit us at booth 3022.



October, 5, 2005:
JCMwave's Photolithography Simulator is presented at the BACUS meeting, Monterey
Proc. SPIE Vol. 5992 (2005) 378-389. [preprint]



June, 13-16, 2005:
JCMwave presents it's products at Laser 2005, Munich, Germany
Please visit us at Hall B1, booth 460.






April, 28-29, 2005:

JCMwave and its partner institution Zuse Institute Berlin present advanced software solutions at the Berlin parliament in an event organized by the initiative OpTecBB.
OptecBB


March, 2005:
Two scientific articles are published which investigate in detail the capabilities of JCMwave's solvers.
Proc. SPIE Vol. 5728 (2005) 164-173. [preprint]
Proc. SPIE Vol. 5728 (2005) 192-202. [preprint]



















All rights reserved, JCMwave GmbH, 2007.
JCMwave GmbH, Haarer Str. 14a, D-85640 Putzbrunn, Germany,
Tel.: +49(0)89 460 65 68, Fax: +49 (0)89 2555 132 369
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