NanoMaC

March 31, 2024

Nanooptical simulation and machine learning for chip metrology.

Nanooptical Simulation and Machine Learning for Chip Metrology (NanoMaC)

Chip production consists of many process steps that must be carried out with high precision. Ellipsometry and reflectometry are fast and non-destructive inverse measurement methods and play a key role in quality control.

In NanoMaC, advanced machine learning surrogates such as Gaussian processes and Bayesian neural networks are developed to reconstruct geometry parameters quickly and accurately from optical measurements.

Partners

JCMwave GmbH, Berlin, Germany

sentronics metrology GmbH, Mannheim, Germany

Zuse Institute Berlin, Berlin, Germany

Funding

German Federal Ministry of Research, Technology and Space (BMFTR). Grant No. 01 IS 24 005.