Applications
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Benchmark of rigorous methods for electromagnetic field simulation with application to lithography simulations.
Results obtained with finite-element methods and with waveguide-methods are compared for 3D application cases from the field of computational lithography.
S. Burger, et al. Benchmark of rigorous methods for electromagnetic field simulation. Proc. SPIE Vol. 7122, 71221S (2008).
2008 DOI Publication link
Optical and EUV Lithography, software benchmarks
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Benchmark of computational methods for mask simulation in optical lithography
Various rigorous methods for simulation of light propagation through optical lithography photomasks are compared.
S. Burger, et al. Benchmark of FEM, Waveguide and FDTD Algorithms for Rigorous Mask Simulation. Proc. SPIE 5992, 368 (2005).
2005 DOI Publication link
Optical Metrology and Sensing, Optical and EUV Lithography, software benchmarks